<application number>200620126297
The utility model relates to a planar magnetron sputtering device for rotating an eccentric shaft of an ITO coated glass, which comprises: an ITO target (2), an oxygen-free copper plate (3), a longer magnet (4), a magnet base. a seat (5), a target seat (6), a shaft seat (7), an eccentric shaft (9) and a bearing housing (10), the oxygen-free copper plate (3) is fixed inside the target seat (6), and the ITO target ( 2) The welding is fixed on the inner side of the oxygen-free copper plate (3), the magnet base (5) is disposed in the target seat (6), and is arranged in parallel with the oxygen-free copper plate (3), and the magnet (4) is fixed on the magnet base for a long time. (5) Inside, the bearing housing (10) is fixed on the outside of the magnet base (5), the bearing (11) is placed in the bearing housing (10), and the shaft seat (7) is fixed on the outside of the target seat (6), and the eccentric shaft ( 9) The inner end is eccentrically connected to the bearing housing (10) through the bearing (11), and the middle portion is placed in the shaft seat (7). The central groove portion of the target etching of the utility model is widened, and the utilization rate of the target material is 60% to 70%, which is three times that of the original.